Air Sampling
News
Casella introduces CEL-712 data logging instrument– 12-Mar-2013
For the real-time detection of airborne dusts, fumes and aerosols
Vaisala reports sales and profit increase in Q3– 5-Nov-2012
Controlled Environment Business sales up by 16% to €20.8m
Air Monitors launches bioaerosol sampler– 30-Oct-2012
Utilises wet-walled cyclone technology to improve bioaerosol sampling
Vaisala to cut ten jobs in Vancouver, Canada– 4-Oct-2012
Result of relocation of board assembly, final assembly and testing to Malaysia and Finland
Hach Lange to focus on accuracy and process optimisation at WWEM 2012– 28-Sep-2012
Will unveil the latest MCERTS approved instruments
Cherwell to exhibit environmental monitoring range at PHSS Conference– 28-Sep-2012
Including DataTrace wireless data loggers and Redipor range
Air monitoring device for isolators and RABS– 14-Sep-2012
It enables sampling heads for standard Petri dishes to be installed at critical control points
First real-time measure of cleanroom particle deposition– 14-Sep-2012
The APMON, which counts particles that land on a work area, was on show at ICCCS 2012 Zurich
Reliable and convenient active air monitoring for microbes – 23-Aug-2012
Merck Millipore’s portfolio of solutions for environmental monitoring encompasses a variety of systems for microbial monitoring in cleanrooms and isolators to cater for any set of requirements
TEOM particulate monitor passes equivalence tests– 6-Mar-2012
1405-F provides benefits of TEOM technology with FDMS volatiles and non-volatiles measurement
Vaisala reports increased sales in 2011– 9-Feb-2012
Net sales in Controlled Environment segment grow 13% year-on-year
SafeBridge develops analysis method for lactose and mannitol – 11-May-2011
For containment performance verification studies
Articles
AMC: an emerging class of contamination– 1-Oct-2012
Airborne particles are often regarded as the number one contamination source in cleanrooms and controlled production environments, but some trace gases are undesirable for several industrial requirements and processes and are therefore defined as airborne molecular contamination. This kind of contamination is becoming steadily more important in critical cleanroom manufacturing processes.
Meeting the needs of EUV lithography– 1-Aug-2012
The requirements to reduce airborne molecular contamination (AMC) in semiconductor manufacturing cleanrooms are becoming more stringent as the industry prepares to migrate to extreme ultraviolet (EUV) lithography. The Tiger-i platform of analysers from Tiger Optics eliminate the concerns arising from other analytical techniques. By utilising Tiger’s patented CW-CRDS technique, the instruments provide calibration-free, real-time analysis without the concerns of a radioactive source
Six Sigma demystified– 27-Nov-2003
Dr David Johnston of Matrix Projects gives us the lowdown on the Six Sigma concept