Ultra Clean Processing of Semiconductor Surfaces (UCPSS)
Categories | Cleaning | Sterilisation | Decontamination | Topics | Healthcare | Hi-tech Manufacturing |
19 - 22 September 2010
Ostend, Belgium
This symposium is a biannual event which aims to increase the level of understanding of ultra-clean processing technology in all steps of micro-, nano-electronics applications and 3D integration. Topics will include fundamentals of contaminants on surfaces; trade-offs between cleaning performance, substrate damage and etching; and surface chemistry, passivation, conditioning and characterisation of group IV and III/V materials (Si, Ge, GaAs and InGaAs) for sensitive FEOL processes (high-k-metal gate stacks dielectrics, Ge surfaces, III-V, epitaxy, ALD)
Organiser: Momentum