Pall partners ISMI to develop contamination control solutions
Pall Corporation, a manufacturer of filtration, separation and purification technologies, has joined the International Sematech Manufacturing Initiative (ISMI) programme at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in the US.
Pall, based in Port Washington, New York, will work with chipmakers and suppliers on equipment stability and sustainability as well as factory processing issues.
“The increasing complexity of semiconductor devices gives rise to the need for more sophisticated contamination control solutions,” said Steve Chisolm, president of Pall Microelectronics. “Our partnership with ISMI will enable further development of innovative cleaning processes to help semiconductor manufacturers meet their contamination control challenges.”
ISMI is working with semiconductor manufacturers to develop manufacturing systems to solve productivity, cost, and cycle time issues in the semiconductor industry.
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